(R. S. Turley, L. V. Knight, D. D. Allred)
We are studying the physics of coherent and incoherent EUV and soft x-ray sources. The x-ray signature of hot plasmas contains information about the physical plasma state. We use these signatures understand the physics of the plasma state. We want to know how these plasmas evolve, how they change with different elements, how the equations of state depend on operating conditions, how the plasmas interact with walls, and so forth. This information will aid the development of bright EUV and X-Ray sources.
Bright EUV and X-Ray sources are used in a number of research fields. In photolithography shorter wavelength sources write smaller features. In microscopy, shorter wavelengths can be used to "see" smaller features. EUV and soft x-ray sources allow in vitro microscopy measurements with a minimum of damage to living tissues. Short wavelength sources also find applications in plasma diagnostics and other fields.
We are also addressing materials questions in the EUV and soft x-ray spectral regions. The optical properties of materials in these spectral regions still demonstrate a strong dependence on the valence properties, and we are developing methods of measuring optical constants, indicies of refrection, and polarization properties. These questions find applications in some of our other research projects, such as
Some of our spectroscopic work includes a close collaboration with Alexander Shevelko of the Lebedev Physical Institute in Moscow, as well as with researchers at Los Alamos National Laboratory, Lawrence Livermore National Laboratory, the University of Utah, Vanderbilt University, the University of Mexico and the Polytechnic University in Mexico, the Institute of Spectroscopy and the University of Moscow in Russia and others
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Last modified 12 Nov 1998 by S. D. Bergeson