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Thin Film Optical Constants in the EUV using Simultaneous Reflection and Transmission Measurements
Thursday, November 3, 2005, 11:40am, Room 306
| Session: |
Optical Thin Films |
| Presenter: |
G.A. Acosta, Brigham Young University |
| Authors: |
D.D. Allred, Brigham Young University
G.A. Acosta, Brigham Young University
R.S. Turley, Brigham Young University
J.E. Johnson, Brigham Young University
K.R. Adamson, Harvard University
N. Farnsworth, Brigham Young University |
| Correspondent: |
Click to Email |
We discuss the use of variable-angle transmission/reflection
measurements for determination of optical constants of thin films from
50 to 600 eV. Such techniques have been widely used in the visible
portion of the electromagnetic spectrum, but are relatively less well
known in the EUV and beyond. For this range, depositing a thin film on
a transparent substrate is impossible since partially transparent films
must be less than ~50 nm and transparent substrates are unknown.
Instead we deposited films directly on the surface of a diode detector.
We expanded the technique by measuring simultaneously, both reflection
from, and transmission at, the same position on the diode to minimize
errors stemming from film nonuniformity. Two materials so studied at
CXRO's beamline 6.3.2 at the Advanced Light Source at the Berkeley
National Laboratory were reactively sputtered thorium oxide and
scandium oxide. We will report the complex index of refraction obtained
by fitting this data for a number of energies in this range.
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