2010 Spring Research Conference
“Analysis of Anomalous Film Growth when Yttrium Oxide is Exposure to Vacuum-Ultraviolet Light” Devon Mortensen,
We have recently found that exposure under a vacuum-ultraviolet lamp causes a yttrium oxide film to increase in thickness. This result was completely unexpected and therefore demanded further investigation. We have experimentally observed the following:
1. These effects are noticeably absent under the same conditions for a plain silicon wafer.
2. When placed in a furnace the changes rendered to the yttrium oxide sample are reversed.
3. A film placed in a plasma cleaner does not show this increase.
Analysis of changes in optical constants and chemical composition of our sample in correlation with film growth seem to suggest the possible formation of a previously unknown yttrium-ozonide chemical state.