Session K3: Condensed Matter, Thin Films

11:30 AM–12:30 PM, Saturday, October 16, 2010
Room: 404B

Chair: Ryan O'Hayre, Colorado School of Mines

Abstract ID: BAPS.2010.4CF.K3.2

Abstract: K3.00002 : Deposition of Metals via Chemical Vapor Deposition

11:42 AM–11:54 AM

Preview Abstract


  David McKenna
    (Brigham Young University)

  David Allred
    (Brigham Young University)

  Robert Davis
    (Brigham Young University)

In an effort to develop a CVD process to deposit metals on various substrates I have created a multi-gas system with a computer controlled interface. This allows the use of up to 5 different gasses as reactants or carriers for the CVD process. I have also fabricated a specialized heated [gas flow chamber wherein solid materials can be volatilized with heat and carried to the substrate by gas also heated in the chamber. I will present the design of this chamber and it's function in our current deposition process along with preliminary results of the deposition of tungsten on various substrates.

To cite this abstract, use the following reference: