| Abstract: |
The purpose of the capstone project was to develop a less costly process of patterning vertical structures in amorphous silicon for use in photovoltaics. Two processes were followed in trying to develop the mold. The first process centered on using a 3 micron layer of photoresist SU-8 10, a viscous polymer creating a pattern using lithography and spun on hydrogen silsesquioxane (HSQ) to create a reusable reverse glass mold. This process resulted in an unusable pattern with unclean lines and definition. A second process was planned after the failure of the first process. The second process centered on polyimide, a different polymer, using lithography to create a reusable reverse mold. The initial results with polyimide are promising and will continue to be investigated. |